Fingered capacitor with low-k and ultra-low-k dielectric layers

ABSTRACT

An integrated circuit having a fingered capacitor with multiple metal fingers formed in inverted-trapezoid-shaped trenches in a multi-layer structure having a polish stop layer over an ultra-low-K dielectric layer over a low-K dielectric layer over a dielectric cap layer. The ultra-low-K dielectric layer reduces capacitance variations between the fingers, while the polish stop layer prevents metal height variations that would otherwise result from performing CMP directly on the ultra-low-K dielectric layer. The layered structure may include another low-K dielectric layer over the polish stop layer that provides a soft landing for the CMP. The polish stop layer may be removed after the CMP polishing and another ultra-low-K dielectric layer may be formed to encapsulate the tops of the metal fingers in the ultra-low-K dielectric material.

BACKGROUND

The present invention relates to semiconductor integrated circuit (IC)fabrication and, more particularly, to fingered capacitors.

Fingered capacitors or fringe capacitors are commonly used inAnalog-Mixed Signal (AMS) ICs. FIG. 1 is based on FIG. 1 of U.S. Pat.No. 6,385,033, which is a perspective view of a conventional fingeredcapacitor 100 having a first capacitor element 120. The first capacitorelement 120 includes a positive metal plate 130 and a negative metalplate 140. The positive metal plate 130 has a comb-like structure thatincludes an elongated end portion 132 having fingers 134 extendingperpendicular from the end portion 132. The negative metal plate 140also has a comb-like structure that includes an elongated end portion142 having fingers 144 extending perpendicular from the end portion 142.The fingers 134 and 144, which are preferably evenly spaced and haveconsistent widths and lengths, are interdigitated (i.e., interleaved)within the same layer of the integrated circuit (IC) die (not shown). Adielectric fills the space between the respective fingers 134 and 144.Deep sub-micron IC manufacturing processes or techniques allow thespacing between the fingers to be close enough such that fringecapacitance between the edges of adjacent fingers within each layer isquite significant. Capacitance has been found to increase as the spacingbetween the fingers decreases. The newest techniques of forming devicesin integrated circuits allow smaller spacing between fingers to generaterelatively large amounts of fringe capacitance.

FIG. 2 is a cross-sectional side view of a portion of a conventionalfingered capacitor 200, such as the fingered capacitor 100 of FIG. 1,along the perpendicular cut-line AA′ of FIG. 1. In particular, FIG. 2shows three adjacent metal fingers 210 of the fingered capacitor 200,which would typically have one or more additional, equivalent fingers tothe left and/or right of the three fingers 200. The three metal fingers210 in FIG. 2 could correspond to, in FIG. 1, one of the positive-platefingers 134 located between two negative-plate fingers 144 or one of thenegative-plate fingers 144 located between two positive-plate fingers134. The fingered capacitor 200 can be implemented in one metal layer ofa multi-layer integrated circuit having one or more metal layers belowthe metal layer of the fingered capacitor 200 and/or one or more metallayers above that metal layer, but it is typically replicated acrossseveral metal layers in order to get higher fringe capacitance at thesame layout area.

As shown in FIG. 2, the fingered capacitor 200 comprises a bottomdielectric cap layer 202 that provides copper passivation and alsofunctions as an etch stop layer. Above the dielectric cap layer 202 is alow-K dielectric layer 204. Located within “inverted-trapezoid-shaped”trenches formed in the low-K dielectric layer 204 are copper traces thatform the metal fingers 210. Covering the low-K dielectric layer 204 andthe metal fingers 210 is a top dielectric cap layer 212, upon which oneor more other metal layers (not shown) may be fabricated.

FIGS. 3A-3D are cross-sectional side views illustrating a conventionalprocess for fabricating the fingered capacitor 200 of FIG. 2. FIG. 3Ashows a multi-layer structure 320 having the low-K dielectric layer 204formed over the dielectric cap layer 202. FIG. 3B shows the structure330 after trenches 309 have been formed in the low-K dielectric layer204 of FIG. 3A using conventional photolithography techniques. FIG. 3Cshows the structure 340 after (i) the trenches 309 of FIG. 3B have beenfilled with copper plating and then (ii) chemical-mechanical polishing(CMP) is performed to provide the structure 340 with a flat uppersurface. FIG. 3D shows the fingered capacitor 200 formed by applying thetop dielectric cap layer 212 over the structure 340 of FIG. 3C.

As should be apparent from above, precision and uniformity across thewafer are the two key requirements of fingered capacitors. However, dueto the nature of the Chemical-Mechanical-Polish (CMP) process, the metalthickness is not so easy to control. It would be advantageous to be ableto better control the metal thickness.

BRIEF DESCRIPTION OF THE DRAWINGS

The invention, together with objects and advantages thereof, may best beunderstood by reference to the following description of the presentlypreferred embodiments together with the accompanying drawings in which:

FIG. 1 corresponds to FIG. 1 of U.S. Pat. No. 6,385,033, which is aperspective view of a conventional fingered capacitor;

FIG. 2 is a cross-sectional side view of a portion of a conventionalfingered capacitor;

FIGS. 3A-3D are cross-sectional side views illustrating a conventionalprocess for fabricating the fingered capacitor of FIG. 2;

FIGS. 4A-4D are cross-sectional side views illustrating a process forfabricating a fingered capacitor according to one embodiment of theinvention;

FIGS. 5A-5D are cross-sectional side views illustrating a process forfabricating a fingered capacitor according to another embodiment of theinvention; and

FIGS. 6A-6C are cross-sectional side views illustrating a process forfabricating a fingered capacitor according to yet another embodiment ofthe invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

One problem with the architecture of the conventional fingered capacitor200 of FIG. 2 is the variation in the overall capacitor capacitancelevel that can exist for different instances of the fingered capacitor200. The overall capacitance level of a particular instance is afunction of the horizontal distances between adjacent fingers 210 in thefingered capacitor 200 and the metal height. Variations in thosehorizontal distances for different instances of the fingered capacitor200 or the metal height can result in variations in the overallcapacitance level for those different instances.

Due to their inverted-trapezoid shape, the horizontal distance betweenadjacent metal fingers 210 is shorter at the tops of the metal fingers210 than at their lower regions. Since shorter distance implies greaterfringe capacitance, the contribution to variation in overall capacitancelevel is greater at the tops of the metal fingers 210 than at theirlower regions.

One way to address this capacitance variation issue is to deploy,adjacent to the tops of the inverted-trapezoid-shaped metal fingers, adielectric material having a relative permittivity (also known asdielectric constant or K value) that is lower than the K value of thedielectric material deployed adjacent to the lower regions of thosemetal fingers. The lower K value of the dielectric material adjacent tothe tops of the metal fingers will reduce the corresponding relativecontribution to the overall capacitance level, thereby reducing themagnitude of the variation in the overall capacitance level due tovariations in horizontal inter-finger distances for different instancesof the fingered capacitor.

One problem with deploying a low-K dielectric material is that thesubsequently applied CMP can result in undesirable metal heightvariation (i.e., deviation of the polished surface from beingsufficiently flat). Changing the low-K dielectric to an ultra-low-Kdielectric adjacent to the tops of the metal fingers makes the problemeven worse. To address this problem, a polish stop layer can be appliedover the lower-K dielectric layer prior to CMP, which will typicallyresult in the polished surface having less metal height variation. Insome embodiments, at least a portion of the polish stop layer remains inthe final fingered capacitor, while, in other embodiments, the entirepolish stop layer is removed during the fabrication process.

One aspect of the present invention is an integrated circuit having aplurality of fingers forming a fingered capacitor. The fingeredcapacitor includes a first dielectric cap layer, a first dielectriclayer formed over the dielectric cap layer and having a first K value,and a second dielectric layer formed over the first dielectric layer andhaving a second K value lower than the first K value. The fingers areformed in the first and second dielectric layers. A second dielectriccap layer is formed over the fingers and the second dielectric layer.

Another aspect of the present invention is a method for fabricating afingered capacitor. The method includes forming a first dielectric caplayer, and then forming a first dielectric layer having a first K valueover the dielectric cap layer. Next a second dielectric layer having asecond K value lower than the first K value is formed over the firstdielectric layer. Then, the fingers are formed in the first and seconddielectric layers. Next, a second dielectric cap layer is formed overthe fingers and the second dielectric layer.

FIGS. 4A-4D are cross-sectional side views illustrating a process forfabricating a fingered capacitor 400 according to one embodiment of thepresent invention.

FIG. 4A shows a multi-layered structure 420 after a low-K dielectriclayer 404, then an ultra-low-K dielectric layer 406, and then a polishstop layer 408 are formed over a bottom dielectric cap layer 402. Thebottom dielectric cap layer 402 provides metal (e.g., copper)passivation and also functions as an etch stop layer. The bottomdielectric cap layer 402, which has a K value between about 3.0 andabout 7.5, may be made of any suitable material, such as (withoutlimitation) SiN, SiCN, aSiC:H, and SiC_(x)N_(y)H_(z). The low-Kdielectric layer 404, which has a K value between about 2.5 and about3.6 and typically about 2.7, may be made of any suitable material, suchas (without limitation) SiCOH, p-SiCOH, and Polyarelene (PAE). Theultra-low-K dielectric layer 404, which has a K value of less than about2.5, may be made of any suitable material, such as (without limitation)Carbon. doped SiO₂, Parvlene-F, Bezocycloutane (BCB), and Teflon AF. Thepolish stop layer 408, which has a K value between about 2.5 and about4.0, may be made of any suitable material, such as (without limitation)SiOC, SiC_(x)N_(y), and SiCN:H.

FIG. 4B shows the structure 430 after trenches 409 have been etched intothe polish stop layer 408, the ultra-low-K dielectric layer 406, and thelow-K dielectric layer 404 of FIG. 4A. Those skilled in the art willknow how the trenches 409, as well as the other layers of the fingeredcapacitor 400, can be formed using conventional photolithographytechniques for fabricating integrated circuits.

FIG. 4C shows the structure 440 after copper plating and CMP polishinghave been performed to fill the trenches 409 of FIG. 4B with copper toform metal fingers 410. Note that the CMP polishing removes only aportion of the polish stop layer 408 in order to provide the structure440 with a relatively flat upper surface having relatively small metalheight variation. Note that, in the structure 440, the top surfaces ofthe metal fingers 410 are co-planar with the top surface of the polishstop layer 408. Although not shown in the figures, a liner layer isapplied to the trenches 409 prior to the copper plating to function as ametal plating seed and a metal barrier layer between the metal fingers410 and the underlying dielectric 404/406/408.

FIG. 4D shows the fingered capacitor 400 formed by applying the topdielectric cap layer 412 over the structure 440 of FIG. 4C. The topdielectric cap layer 412 can be, but does not have to be, formed usingthe same material as the bottom dielectric cap layer 402. Additionalpolishing can be applied to the top dielectric cap layer 412 to make thesurface flat. Analogous to FIG. 2, FIG. 4D is a cross-sectional view ofa portion of the fingered capacitor 400 corresponding to three adjacentfingers 410. Here, too, there may be one or more metal layers belowand/or one or more metal layers above the metal layer in which thefingered capacitor 400 is formed.

In fabricating the fingered capacitor 400, the low-K dielectric layer404 is formed directly over the bottom dielectric cap layer 402, theultra-low-K dielectric layer 406 is formed directly over the low-Kdielectric layer 404, the polish stop layer 408 is formed directly overthe ultra-low-K dielectric layer 406, and the top dielectric cap layer412 is formed directly over the polish stop layer 408. In alternativeimplementations, there may be one or more suitable intervening layersbetween one or more of these different layer pairs. Such layer(s) canenhance adhesion and/or mechanical strength.

FIGS. 5A-5D are cross-sectional side views illustrating a process forfabricating a fingered capacitor 500 according to another embodiment ofthe invention.

FIG. 5A shows a multi-layer structure 520 after a first low-K dielectriclayer 504, then an ultra-low-K dielectric layer 506, then a polish stoplayer 508, and then a second low-K dielectric layer 511 are formed overa bottom dielectric cap layer 502. The bottom dielectric cap layer 402,the first low-K dielectric layer 504, the ultra-low-K dielectric layer506, and the polish stop layer 508 can be, but do not have to be, madeof the same materials as the corresponding layers in the fingeredcapacitor 400 of FIG. 4D. The second low-K dielectric layer 511 can be,but does not have to be, made of the same material as the first low-Kdielectric layer 504.

FIG. 5B shows the structure 530 after trenches 509 have been etched intothe second low-K dielectric layer 511, the polish stop layer 508, theultra-low-K dielectric layer 506, and the first low-K dielectric layer504 of FIG. 5A. Those skilled in the art will know how the trenches 509,as well as the other layers of the fingered capacitor 500, can be formedusing conventional photolithography techniques for fabricatingintegrated circuits.

FIG. 5C shows the structure 540 after copper plating and CMP polishinghave been performed to fill the trenches 509 of FIG. 5B with copper toform metal fingers 510. Note that the CMP polishing removes all of thesecond low-K dielectric layer AJ and little if any of the polish stoplayer 508 in order to provide the structure 540 with a relatively flatupper surface having relatively small metal height variation. The secondlow-K dielectric layer AJ, which is typically made of a material that issofter than the material of the polish stop layer 508, provides a “softlanding” for better process control during the CMP polishing step andcan enable less material to be used for the polish stop layer 508.Although not shown in the figures, a liner layer is applied to thetrenches 509 prior to the copper plating to function as a metal platingseed and a metal barrier layer between the metal fingers 510 and theunderlying dielectric 504/506/508/511. Note that, in the structure 540,the top surfaces of the metal fingers 510 are co-planar with the topsurface of the polish stop layer 508. Note also that the structure 540is substantially identical to the structure 440 of FIG. 4C.

FIG. 5D shows the fingered capacitor 500 formed by applying the topdielectric cap layer 512 over the structure 540 of FIG. 5C. The topdielectric cap layer 512 can be, but does not have to be, formed usingthe same material as the bottom dielectric cap layer 502. Additionalpolishing can be applied to the top dielectric cap layer 512 to make thesurface flat. Analogous to FIG. 2, FIG. 5D is a cross-sectional view ofa portion of the fingered capacitor 500 corresponding to three adjacentfingers 510. Here, too, there may be one or more metal layers belowand/or one or more metal layers above the metal layer in which thefingered capacitor 500 is formed. Note that the structure of thefingered capacitor 500 is substantially identical to the structure ofthe fingered capacitor 400 of FIG. 4C.

In fabricating the fingered capacitor 500, the first low-K dielectriclayer 504 is formed directly over the bottom dielectric cap layer 502,the ultra-low-K dielectric layer 506 is formed directly over the firstlow-K dielectric layer 504, the polish stop layer 508 is formed directlyover the ultra-low-K dielectric layer 506, the second low-K dielectriclayer 511 is formed directly over the polish stop layer 508, and, afterthe second low-K dielectric layer 511 is completely removed during theCMP polishing, the top dielectric cap layer 512 is formed directly overthe remaining polish stop layer 508. In alternative implementations,there may be one or more suitable intervening layers between one or moreof these different layer pairs. Such layer (s) can enhance adhesion.and/or mechanical strength.

FIGS. 6A-6C are cross-sectional side views illustrating a process forfabricating a fingered capacitor 600 according to yet another embodimentof the invention. The process of FIGS. 6A-6C can begin with either thestructure 440 of FIG. 4C or the similar structure 540 of FIG. 5C. Thefollowing discussion is based on the process of FIGS. 6A-6C beginningwith the structure 440 of FIG. 4C. Those skilled in the art willunderstand how to perform an analogous process beginning with thesimilar structure 540 of FIG. 5C.

FIG. 6A shows the structure 440 of FIG. 4C formed as described above inthe context of FIGS. 6A-6C.

FIG. 6B shows the structure 650 formed by etching away the remainingmaterial of the polish stop layer 408 of FIG. 6A. Note that, in thestructure 650, the top surfaces of the metal fingers 410 extend abovethe top surface of the (first) ultra-low-K dielectric layer 406.

FIG. 6C shows the fingered capacitor 600 formed by applying a secondultra-low-K dielectric layer 611 and a top dielectric cap layer FI overthe structure 650 of FIG. 6B. The second ultra-low-K dielectric layer611 may be formed using the same material as the first ultra-low-Kdielectric layer 406, and the top dielectric cap layer 612 can be, butdoes not have to be formed using the same material as the bottomdielectric cap layer 502. The second ultra-low-K dielectric layer 611can further reduce overall capacitance variations by completelyencapsulating the tops of the metal fingers 410 with ultra-low-Kdielectric material. Additional polishing can be applied to the topdielectric cap layer 612 to make the surface flat. Analogous to FIGS. 2and 3, FIG. 6C is a cross-sectional view of a portion of the fingeredcapacitor 600 corresponding to three adjacent fingers 510. Here, too,there may be one or more metal layers below and/or one or more metallayers above the metal layer in which the fingered capacitor 600 isformed.

In fabricating the fingered capacitor 600, the low-K dielectric layer404 is formed directly over the bottom dielectric cap layer 402, thefirst ultra-low-K dielectric layer 406 is formed directly over the low-Kdielectric layer 404, the polish stop layer 408 is formed directly overthe first ultra-low-K dielectric layer 406, after the polish stop layer408 has been completely removed, the second ultra-low-K dielectric layer611 is formed directly over the first ultra-low-K dielectric layer 406,and the top dielectric cap layer 612 is formed directly over the secondultra-low-K dielectric layer 611. In alternative implementations, theremay be one or more suitable intervening layers between one or more ofthese different layer pairs. Such layer(s) can enhance adhesion and/ormechanical strength.

It should be apparent to those skilled in the art that the presentinvention provides a method or fabricating a fingered capacitor thatemploys a polish stop layer to control the metal thickness. The trenchis normally designed as inverted trapezoid shape for easy trench etchand metal plating, which gives shorter top metal space than that ofbottom metal. An ultra-low-K dielectric is introduced at the top metalposition to control any extra variation there. The method allows forhigh precision and high uniformity fringe capacitors with little processadd-on.

In the present invention, the polish stop layer can reduce metal heightvariation from CMP. The ultra-low-K material at the top part can reduceany extra variation caused by inverted trapezoid metal shape, and theextra ultra-low-K material re-deposition can further reduce anyvariation caused by inverted trapezoid metal shape.

The present invention may be embodied in many other specific formswithout departing from the spirit or scope of the invention.Particularly, it should be understood that the present invention may beembodied in the following forms.

Although the invention has been described in the context of embodimentshaving a second dielectric layer with an ultra-low K value formed over afirst dielectric layer with a low K value, in general, it may besufficient for the K value or the second dielectric layer to be smallerthan the K value of the first dielectric layer, whether or not those twolayers have ultra-low and low K values, respectively.

Although the invention has been described in the context of metalfingers formed of copper, those skilled in the art will understand thatthe fingers can be formed using other suitable metals or even othersuitable non-metallic conductors.

Although the invention has been described in the context of methods forfabricating various embodiments in which CMP polishing is applied atcertain steps. Those skilled in the art will understand that othersuitable processes may be employed other than CMP polishing during someof those steps, such as wet or dry etching processes.

The present examples and embodiments are to be considered asillustrative and not restrictive, and the invention is not to be limitedto the details given herein, but may be modified within the scope andequivalence of the appended claims.

What is claimed is: 1-10. (canceled)
 11. A method for fabricating afingered capacitor comprising a plurality of fingers in an integratedcircuit, the method comprising: forming a first dielectric cap layer;then forming a first dielectric layer over the dielectric cap layer andhaving a first K value; then forming a second dielectric layer over thefirst dielectric layer and having a second K value lower than the firstK value; then forming the fingers in the first and second dielectriclayers; and then forming a second dielectric cap layer over the fingersand the second dielectric layer.
 12. The method of claim 11, wherein:the first dielectric layer is formed directly over the first dielectriccap layer; and the second dielectric layer is formed directly over thefirst dielectric layer.
 13. The method of claim 11, further comprising:before the fingers are formed, forming a polish stop layer over thesecond dielectric layer, wherein the fingers are also formed in thepolish stop layer; and after the fingers are formed, performing CMPpolishing, wherein: the CMP polishing removes some, but not all of thepolish stop layer; and after the CMP polishing, the top surfaces of thefingers are co-planar with the top surface of the polish stop layer. 14.The method of claim 13, wherein the polish stop layer is formed directlyover the second dielectric layer.
 15. The method of claim 13, wherein,after the CMP polishing, the second dielectric cap layer is formed overthe polish stop layer.
 16. The method of claim 15, wherein the seconddielectric cap layer is formed directly over the polish stop layer. 17.The method of claim 13, further comprising: after the CMP polishing,removing the remaining polish stop layer using a non-CMP polishingprocess; and then forming a third dielectric layer over the seconddielectric layer and the fingers, wherein the second dielectric caplayer is formed over the third dielectric layer.
 18. The method of claim17, wherein: the third dielectric layer is formed directly over thesecond dielectric layer; and the second dielectric cap layer is formeddirectly over the third dielectric layer.
 19. The method of claim 17,wherein the third dielectric layer has a third K value equal to thesecond K value of the second dielectric layer.
 20. The method of claim13, wherein: before the fingers are formed, forming a third dielectriclayer over the polish stop layer, wherein the fingers are also formed inthe third dielectric layer; and the CMP polishing removes all of thethird dielectric layer.
 21. A method for fabricating a fingeredcapacitor comprising a plurality of fingers in an integrated circuit,the method comprising: forming a first dielectric cap layer; forming afirst dielectric layer over the dielectric cap layer and having a firstK value; forming a second dielectric layer over the first dielectriclayer and having a second K value lower than the first K value; formingthe fingers in the first and second dielectric layers; forming a seconddielectric cap layer over the fingers and the second dielectric layer;and forming a third dielectric layer over the second dielectric layerand the fingers, the second dielectric cap layer formed over the thirddielectric layer.
 22. The method of claim 21, wherein the thirddielectric layer has a third K value equal to the second K value of thesecond dielectric layer.
 23. The method of claim 21, wherein the firstdielectric layer is formed directly over the first dielectric cap layer,and wherein the second dielectric layer is formed directly over thefirst dielectric layer.
 24. The method of claim 21, wherein the thirddielectric layer is formed directly over the second dielectric layer,and wherein the second dielectric cap layer is formed directly over thethird dielectric layer.
 25. The method of claim 21, further comprising:before the fingers are formed, forming a polish stop layer over thesecond dielectric layer, wherein the fingers are also formed in thepolish stop layer.
 26. The method of claim 25, wherein the polish stoplayer is formed directly over the second dielectric layer.
 27. Themethod of claim 25, wherein the second dielectric cap layer is formeddirectly over the polish stop layer.
 28. A method for fabricating afingered capacitor comprising a plurality of fingers in an integratedcircuit, the method comprising: forming a first dielectric cap layer;forming a first dielectric layer over the dielectric cap layer andhaving a first K value; forming a second dielectric layer over the firstdielectric layer and having a second K value lower than the first Kvalue; forming the fingers in the first and second dielectric layers;forming a second dielectric cap layer over the fingers and the seconddielectric layer; and forming a third dielectric layer over the seconddielectric layer and the fingers, the second dielectric cap layer formeddirectly over the third dielectric layer.
 29. The method of claim 28,wherein the first dielectric layer is formed directly over the firstdielectric cap layer, and wherein the second dielectric layer is formeddirectly over the first dielectric layer.
 30. The method of claim 28,wherein the third dielectric layer has a third K value equal to thesecond K value of the second dielectric layer.